Advanced Technology

MOCVD / ALD Precursors
MOCVD:Metal Organic Chemical Vapor Deposition
ALD:Atmic Layer Deposition

TANAKA develops and produces high-purity precursors for semiconductors and offers more environmentally-friendly recycling technologies.

Development and Provision of Precursors

TANAKA has developed various types of chemical vapor deposition (CVD) and atomic layer deposition (ALD) precursors. With CVD systems for producing thin semiconductor films and providing various analyzers data for evaluating thin films(field emission scanning electron microscope [FE-SEM], atomic force microscope [AFM], glow-discharge mass spectrometer [GD-MS], etc.), TANAKA offers precursors that are ideal for a variety of different purposes.

Examples of precursor products (ruthenium)

TANAKA develops ruthenium precursors and all other types of precious metal precursor.

Product Name Structure
Pale yellow liquid
Carish Pale yellow liquidのイメージ
Orange crystal
Ru3(CO)12 Orange crystalのイメージ
Pale yellow liquid
Ru(EtCp)2 Pale yellow liquidのイメージ

Precursor Recycling Technology

TANAKA has developed a recycling technology for the refinement of un-reacted used raw materials, which can be offered at a level of quality equivalent to that of new raw materials. This eliminates the need to purchase precious metals or ligands for the synthesizing of raw materials, making it possible to reduce costs significantly and keep prices stable regardless of fluctuations in the prices of precious metals.

Precursor recycling system *patented

TANAKA's proprietary technique recycles precursors at low cost.

Recycling Process of CVD and ALD Materials *TANAKA's patented process