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- F-7 Metal Organic Chemical Vapor Deposition (MOCVD) and Atomic Layer Deposition (ALD) Precursors
F-7 Metal Organic Chemical Vapor Deposition (MOCVD) and Atomic Layer Deposition (ALD) Precursors
TANAKA develops and produces high-purity precursors for semiconductors and offers more environmentally-friendly recycling technologies.
Development and Provision of Precursors
TANAKA has developed various types of chemical vapor deposition (CVD) and atomic layer deposition (ALD) precursors. With CVD systems for producing thin semiconductor films and providing various analyzers data for evaluating thin films(field emission scanning electron microscope [FE-SEM], atomic force microscope [AFM], glow-discharge mass spectrometer [GD-MS], etc.), TANAKA offers precursors that are ideal for a variety of different purposes.
Examples of precursor products (ruthenium)
TANAKA develops ruthenium precursors and all other types of precious metal precursor.
| Chemical Name | Structure |
|---|---|
RuCp2 Yellow white crystalline |
 |
Ru(EtCp)2 Pale yellow liquid |
 |
Ru(acac)3 Red crystalline |
 |
| Chemical Name | Structure |
|---|---|
RuCpBuCp Pale yellow liquid |
 |
RuCpPrCp Pale yellow liquid |
 |
Ru(nbd)(iHD)2 Bitter orange color liquid |
 |
Precursor Recycling Technology
TANAKA has developed a recycling technology for the refinement of un-reacted used raw materials, which can be offered at a level of quality equivalent to that of new raw materials. This eliminates the need to purchase precious metals or ligands for the synthesizing of raw materials, making it possible to reduce costs significantly and keep prices stable regardless of fluctuations in the prices of precious metals.
Precursor recycling system *patented
TANAKA's proprietary technique recycles precursors at low cost.
